Cimmetry licenses its viewing technology
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Cimmetry Systems product story
Edited by the Engineeringtalk editorial team
Feb 13, 2003
Cimmetry's AutoVue's 2D/3D CAD and EDA viewing and markup technology has been tightly integrated into Synergis Adept 5.1, which is currently shipping.
Cimmetry's AutoVue's 2D/3D CAD and EDA viewing and markup technology has been tightly integrated into Synergis Adept 5.1, which is currently shipping.
Adept users now have the advanced capabilities of Cimmetry's AutoVue as part of the Adept data management solution.
With Adept 5.1, users can view, redline, and print 2D/3D Autodesk Inventor, Autodesk Mechanical Desktop, SolidWorks, AutoCAD and 200 other 2D CAD, raster, vector and office formats from inside Adept.
The new Adept viewer extends a company's ability to collaborate with project teams, contractors and customers over a LAN, WAN, or across the Internet.
"We are extremely pleased to partner with Cimmetry Systems, who is long recognised as the industry leader in viewing and collaboration", said Todd Cummings, director of product development at Synergis Technologies.
"AutoVue's best-in-class technology offers Adept customers an unparalleled level of reliability, scalability, functionality and format fidelity".
"AutoVue's extensive and open API has allowed Synergis to create an exceptional integration", said Steven Birnam, Manager of Business Development at Cimmetry Systems.
"The final result, Synergis Adept 5.1, is a superb combination, providing an extensive feature set and unsurpassed ease of use.
With this latest release, Synergis has cemented their leadership position in the engineering document management market, making them a preferred choice for customers".
Synergis also offers Adept users the opportunity to upgrade, for an additional charge, from the Adept 5.1 viewer to Synergis' ProViewer, which includes Cimmetry AutoVue support for other 3D CAD and EDA formats including Pro/Engineer, Catia, Unigraphics, Solid Edge, Cadence Allegro, Mentor Board Station, Orcad, PCAD, EDIF and more.
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