Stage sets optics in place for inspection

The DynamYX RS air-bearing positioning stage offers an innovative approach to reticule positioning in semiconductor manufacturing inspection systems.

The DynamYX RS air-bearing positioning stage offers an innovative approach to reticule positioning in semiconductor manufacturing inspection systems.

The DynamYX RS is a high performance dual-axis air-bearing stage platform that provides a smaller footprint than traditional open-frame architectures, greater flexibility in the optical system design, and easier access to the optical elements for upgrades and routine maintenance.

Due to the isolated location of the stage's composite reticule holder, the DynamYX RS solves the problem of keeping the reticule away from possible sources of particulate generation.

The DynamYX RS provides the highest level of static and dynamic positioning performance because it is a rigid low-mass single-plane x-y air bearing rather than a stacked dual-axis x-y stage configuration.

The DynamYX RS is part of five-product family of precision air bearing stages designed for high-throughput semiconductor inspection and processing applications.

In the application-specific RS configuration, a rigid composite reticule holder is directly attached to the moving x-y carriage of the stage.

This reticule holder supports and positions the reticule in the large, open area at the front of the stage and incorporates unique static-free vacuum pads, which hold and protect the reticule from dangerous electrical charges.

The granite base is easily customised to accommodate optical fixtures at the front of the system for inspection of the reticule from beneath.

Inspection from above is accommodated by an integrated gantry bridge structure.

With the reticule and optics located in the front of system, away from any moving stage elements or cables, the environment surrounding the reticule is extremely clean.

In addition, customers may take advantage of the DynamYX RS architecture by circulating air from the front to the rear of the system further preventing particles from entering the reticule chamber.

Additional features and benefits are realised with optional integrated accessories including a zero-dither theta offset axis built right into the composite reticule holder, an integrated vertical z stage capable of both long-travel coarse adjustment and fine, in-process, (autofocus) adjustments, and an interferometer mirror which may be integrated directly into the reticule holder to accommodate direct position tracking along the scanning axis.

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