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Product category: Humidity and Environmental Sensors
News Release from: Michell Instruments | Subject: Pura plus trace moisture event sensor
Edited by the Engineeringtalk Editorial Team on 20 November 2007

Moisture analyser monitors fabrication

The Pura plus is an on-line trace moisture event sensor designed for UHP inert gas applications in semiconductor fabs.

Michell Instruments has released the Pura plus trace moisture event sensor The Pura plus is an on-line trace moisture event sensor designed for UHP inert gas applications in semiconductor fabs to allow installation at multiple locations at the final point of entry to the process tool

Installed in the gas distribution system the Pura plus provides rapid indication of a moisture event as low as 20 parts per billion at 1 part per billion baseline.

To achieve this high speed of response while maintaining sensitivity Michell has invented a detection algorithm and combined it with a newly developed UHP suitable ceramic sensor design.

Besides other benefits it allows the Pura plus to meet the particulate shedding performance required by the semiconductor industry.

The Pura plus meets the highest quality standards for material and surface finish.

It is assembled and packed in a class 100 clean room environment.

Pura Plus is designed to operate reliably and without any maintenance for a minimum of two years.

Information is output via Modbus, with warning and alarm status being indicated with a "traffic light" status indicator LEDs.

The new sensor is Michell Instruments' response to the latest changes in the wafer fabrication industry requirements for device size and specification.

The wafer fabrication industry is continuing to push the technical boundaries in terms of device size and packing density.

The current specification for moisture contaminant level in bulk inert gases is less than 10 parts per billion while there is a pressure on in the industry to reduce this specification to less than 1 parts per billion.

Bulk gas supplies are normally monitored for moisture contamination with large, expensive instruments with low speed of response at the point of entry to the fab.

The moisture contamination from the bulk gas supply is a very rare event.

In contrast to this in the complex distribution system of a fab moisture ingress often takes place downstream of the conventional moisture monitoring point through small leaks, imperfect system design, component failure or via procedural failures.

The small size of the Pura plus makes multiple location installations at point of use a realistic and cost-effective proposition to effectively protect the wafer manufacturing process. Request a free brochure from Michell Instruments ...

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