Ion source suits cleaning, etching and deposition
A
Morgan Advanced Ceramics product story
Edited by the Engineeringtalk editorial team
Jun 17, 2002
The Diamonex Closed-drift Source from Morgan Advanced Ceramics is a flexible source ideally suited for a wide range of manufacturing processes that benefit from high flux ions.
The Diamonex Closed-drift (CD) Source from Morgan Advanced Ceramics (MAC) is a flexible source ideally suited for a wide range of manufacturing processes that benefit from high flux ions, including substrate cleaning, reactive ion beam etching, and ion beam assisted deposition of thin films.
It is also a useful tool for high-rate, reliable deposition of DLC coatings.
The gridless design of the Diamonex CD Source allows a high ion flux, and the substrate will not be contaminated by particles releases by the grid.
The CD Source includes an integrated, on axis hollow cathode electron source (HCES), eliminating filaments that burn out or contaminate substrates.
The hollow cathode produces a charge-neutralised beam so that no substrate bias is required.
The unique anode design allows for stable, long-term operation with no process gas restriction.
Using an electromagnet, the CD Source allows flexibility for process development by enhancing and refining the coating material properties.
The Diamonex CD Source is available in a compact (3.5in), flange- or internally-mounted housing operated using state-of-the-art DC and AC power supplies for maximum reliability.
There are no RF interference issues with this source.
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