Product category:
Materials and components
News Release from: Morgan Advanced Ceramics | Subject: Silicon carbide
Edited by the Engineeringtalk Editorial
Team on 21 February 2005
CVD materials aid processing machinery
Morgan Advanced Ceramics offers silicon carbide (SiC) by chemical vapour deposition (CVD) for semiconductor wafer processing equipment through its CVD Materials Division.
Morgan Advanced Ceramics offers silicon carbide (SiC) by chemical vapour deposition (CVD) for semiconductor wafer processing equipment through its CVD Materials Division Using an advanced chemical vapour deposition manufacturing process, CVD Materials produces ultrapure SiC and low electrical resisitivity SiC, both outperforming conventional materials in hostile chemical and plasma environments
This article was originally published on Engineeringtalk on 20 May 2002 at 8.00am (UK)
Related stories
Diamond-like coating is tough stuff
Diamonex DLC from Morgan Advanced Ceramics is a high-performance surface coating, providing ceramic hardness, excellent chemical resistance and low friction.
The unparalleled chemical and erosion resistance and outstanding thermal conductivity of CVD SiC make it well matched for a variety of semiconductor manufacturing components, including edge rings, susceptors, processing chambers, liners and gas distribution plates.
CVD SiC offers high purity, stiffness, dimensional stability and thermal shock resistance, resulting in components with increased durability and longevity.
With theoretical density, intrinsic purity and controllable electrical conductivity, CVD SiC is ideally suited for advanced thermal applications.
High stiffness and material integrity enable very thin cross-section SiC geometry to be produced, lowering thermal mass and increasing throughput and cycle times for applications such as rapid thermal processing.
• Morgan Advanced Ceramics: contact details and other news
• Email this article to a colleague
• Register for the free Engineeringtalk email newsletter
• Engineeringtalk Home Page
