Nikon launches Eclipse MA200 microscope
A
Nikon UK product story
Edited by the Engineeringtalk editorial team
Sep 19, 2008
Nikon Instruments has introduced the Eclipse MA200, an inverted materials microscope optimised for digital imaging and ergonomic efficiency.
The MA200 uses integrated intelligence to automatically combine captured images with data on their observation settings for more comprehensive documentation.
Additionally, its box design allows easy access to the sample on the stage and nosepiece, while making the footprint size one-third of the conventional model.
The MA200 delivers high resolution and high contrast images.
The 1X objective lens enables macro observation with actual field view of 25mm, making it possible to view the whole area of an embedded metallurgical sample.
In addition, the MA200 offers a range of contrast methods including episcopic bright field, episcopic dark field, DIC, simple polarizing and episcopic fluorescence.
The manual nosepiece will output the objective position and internal magnification data out to DS-L2 and Nis-Elements for automatic scale calibration.
The scales size will automatically be calibrated when the objective magnification is changed.
Large image stitching is also possible through the optional stitching function in the Nis-Elements software.
Additionally, by combining the Metalo software module (grain sizing and cast iron), the system will be optimal for JIS and ASTM standard compliant metallurgical analysis.
The Eclipse MA200 is the succeeding model of the TME300/200 and the advanced model of the Eclipse MA100.
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