Nanopositioning/scanning stage suits microscopy
A
PI (Physik Instrumente) product story
Edited by the Engineeringtalk editorial team
Aug 7, 2007
The P-733.3CD's parallel-kinematics design enables higher operating speeds than other piezo scanning stages.
PI has released the P-733.3CD x-y-z nanopositioning/scanning stage.
These high-resolution stages are designed for materials research, high resolution microscopy and imaging applications.
The parallel-kinematics design (only one common moving platform for x-y-z) reduces the moved mass, and enables higher operating speeds than other piezo scanning stages.
Typical Applications include scanning microscopy, nanomanipulation, metrology/interferometry, biotechnology, semiconductor testing, mask/wafer positioning, and image enhancement/stabilisation.
These piezo systems provide a positioning and scanning range of 100x100x10um together with sub-nanometer precision.
The large clear aperture is an advantage in transmitted-light applications.
The high-speed z-axis can actively compensate out-of-plane, z-axis deviation during x-y scans.
Capacitive nano-measuring sensors read the platform position directly and without physical contact.
This makes them free of friction and hysteresis, and allows very high levels of linearity, up to 99.99% with resolution to 0.1nm.
The parallel metrology configuration measures all axes against the same fixed reference, providing better precision than serial (individual) metrology.
In a parallel kinematics multiaxis system, all actuators act directly on the same moving platform.
This means symmetrical dynamic properties of the x and y axes, a prerequisite for fast, high-linearity scanning.
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Contact PI (Physik Instrumente)
Tel +44 1234 756360
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