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Product category: Machine Building Components
News Release from: Reynard | Subject: Bullseye apodising neutral density filter
Edited by the Engineeringtalk Editorial Team on 26 February 2007

Filters solve basic light distribution
problems

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Apodising neutral density filters eliminate undesirable intensity variations in optical systems.

New from Reynard Corp is the Bullseye apodising neutral density filter These filters eliminate undesirable intensity variations in optical systems

The density of the filter decreases radially from a dark centre, where light is usually at its peak intensity, to the outside edge, where it can become completely transparent.

The Bullseye apodising filter can be designed for any Gaussian function regardless to the size of the beam.

The filters are produced on a custom basis, as uniformity variations, substrate type, and bandwidth are a function of the customer's specific optical requirement.

Key features include: density gradients can be customised to suit any application; the filter can be applied to a number of different substrate types; and can be designed to be used from the UV to the far IR.

Inserting a Bullseye apodising filter at the aperture stop of an imaging system modifies the intensity variations of the light source which can result in a flat top distribution.

"Instead of spending effort searching for ideal light sources for your specific application, a Bullseye ND filter can be used to solve basic light distribution problems, saving both time and money", says Forrest Reynard, President of Reynard Corporation.

Application examples are found in diverse industries, such as: entertainment - to make light distribution uneven for cosmetic applications; imaging - to break up diffraction patterns by the introduction of soft edges; industrial - to control the light emission from an automatic welding torch to a CCD camera; military - to eliminate IR detector saturation in ground-to-air and air-to-air missiles; scientific - used as a variable phase plate when the gradient coating material has the same index of refraction as the substrate; and semiconductor - used in photolithography exposing systems to obtain perfect illumination distribution.

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